Core Technology
At PhaseShift, we offer end-to-end metasurface solutions, encompassing design, prototyping, testing and scalable manufacturing to bring groundbreaking products to market.
Design
AI/ML based design approach to metasurfaces provides higher efficiency devices than conventional methods.
Key Capabilities
Capability
High aspect ratio for design flexibility
Subtrate size
Substrate type
Prototype Fabrication
Material agnostic fabrication methods allow for metasurfaces to be fabricated for various industries and ranges from UV to IR wavelengths
Diverse material set for quantum, display, and telecomm applications
Minimum element dimensions for applications at shorter wavelengths
Element shapes for high performance and multifunctional response
Device Testing
Comprehensive optical testing of metasurfaces for focusing efficiency, polarization metrics, and laser induced damage threshold.
Technical Details
Metasurfaces available for UV (>240 nm), VIS, NIR, IR as well as high damage threshold metasurfaces
20:1 aspect ratio
50 nm minimum feature size
Small pieces up to 150mm wafer
Fused Silica, Silicon, Si/Sio2, custom substrates upon request
Rectangular, Elliptical, Circular, Freeform (AI based)